Deformation-Aware Log-Linear Models

  • Authors:
  • Tobias Gass;Thomas Deselaers;Hermann Ney

  • Affiliations:
  • Human Language Technology and Pattern Recognition Group, RWTH Aachen University, Aachen, Germany;Human Language Technology and Pattern Recognition Group, RWTH Aachen University, Aachen, Germany and Now with the Computer Vision Laboratory, ETH Zurich, Switzerland;Human Language Technology and Pattern Recognition Group, RWTH Aachen University, Aachen, Germany

  • Venue:
  • Proceedings of the 31st DAGM Symposium on Pattern Recognition
  • Year:
  • 2009

Quantified Score

Hi-index 0.00

Visualization

Abstract

In this paper, we present a novel deformation-aware discriminative model for handwritten digit recognition. Unlike previous approaches our model directly considers image deformations and allows discriminative training of all parameters, including those accounting for non-linear transformations of the image. This is achieved by extending a log-linear framework to incorporate a latent deformation variable. The resulting model has an order of magnitude less parameters than competing approaches to handling image deformations. We tune and evaluate our approach on the USPS task and show its generalization capabilities by applying the tuned model to the MNIST task. We gain interesting insights and achieve highly competitive results on both tasks.