Single-step optical lift-off process
IBM Journal of Research and Development
MEMS technology for optical networking applications
IEEE Communications Magazine
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Fabricating precise freestanding metal membranes tens of nanometers thick in a continuous stack with a constant air gap of several microns is a key challenge in a free-electron extreme ultraviolet (EUV) source design program. Such a stack, when exposed to a high energy (~9MeV) electron beam, will operate as an EUV light emitting device. A novel MEMS-based microfabrication technique enables manufacturing of a precise-sized large-area membrane infinite stack for exposure by 1mm diameter electron beam. Thermal self-tensioning is used to reach the required planarity of the membranes.