Modeling the pattern spectrum as a Markov process and its use for efficient shape classification

Authors:
E. N. Zois;V. Anastassopoulos
Affiliations:
Research and Development Telecommunications Laboratory, Electronics Dept, Technological and Educational Institute of Athens, Aegaleo, Greece;Electronics Lab, Physics Dept, University of Patras, Patras, Greece
Venue:
ICIP'09 Proceedings of the 16th IEEE international conference on Image processing
Year:
2009

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Abstract

In this work the most important morphological granulometry, i.e. the pattern spectrum, is modeled, for the first time in the literature, as a first order Markov process. In addition, each of the terms of the process is shown to be normally distributed. The classification procedure followed for this specific application is based on modeling each separate class as a Markov process and making extensive use of the chain rule. Experimental results support the proposed classification procedure as quite promising, especially when compared to conventional classification techniques.