Layout and material gradation in topology optimization of functionally graded structures: a global---local approach

  • Authors:

  • Sylvia R. Almeida;Glaucio H. Paulino;Emilio C. Silva

  • Affiliations:

  • Escola de Engenharia Civil, Universidade Federal de Goiás, Goiânia, Brazil 74605-220;Newmark Laboratory, Department of Civil and Environmental Engineering, University of Illinois at Urbana-Champaign, Urbana, USA 61801 and Department of Mechanical Science and Engineering, Universit ...;Department of Mechatronics and Mechanical Systems Engineering, Escola Politécnica da Universidade de São Paulo, São Paulo, Brazil 05508-900

  • Venue:
  • Structural and Multidisciplinary Optimization
  • Year:
  • 2010

Quantified Score

Hi-index 0.00

Visualization

Abstract

By means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials.