A training algorithm for optimal margin classifiers
COLT '92 Proceedings of the fifth annual workshop on Computational learning theory
BAS: a perceptual shape descriptor based on the beam angle statistics
Pattern Recognition Letters
The Image Foresting Transform: Theory, Algorithms, and Applications
IEEE Transactions on Pattern Analysis and Machine Intelligence
Pattern Classification (2nd Edition)
Pattern Classification (2nd Edition)
Supervised pattern classification based on optimum-path forest
International Journal of Imaging Systems and Technology - Contemporary Challenges in Combinatorial Image Analysis
Optimizing Optimum-Path Forest Classification for Huge Datasets
ICPR '10 Proceedings of the 2010 20th International Conference on Pattern Recognition
An overview of statistical learning theory
IEEE Transactions on Neural Networks
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In this work, a new approach for supervised pattern recognition is presented which improves the learning algorithm of the Optimum-Path Forest classifier (OPF), centered on detection and elimination of outliers in the training set. Identification of outliers is based on a penalty computed for each sample in the training set from the corresponding number of imputable false positive and false negative classification of samples. This approach enhances the accuracy of OPF while still gaining in classification time, at the expense of a slight increase in training time.