3D simulations with fields and particles

  • Authors:
  • Branislav Radjenović;Marija Radmilović-Radjenović;Petar Beličev

  • Affiliations:
  • Laboratory of Physics, Vinča Institute of Nuclear Sciences, Belgrade, Serbia and Montenegro;Institute of Physics, Belgrade, Serbia and Montenegro;Laboratory of Physics, Vinča Institute of Nuclear Sciences, Belgrade, Serbia and Montenegro

  • Venue:
  • AEE'06 Proceedings of the 5th WSEAS international conference on Applications of electrical engineering
  • Year:
  • 2006

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Abstract

In this paper we present a methodology and some of the results for 3D simulations that includes both field and particle abstractions. Electromagnetic field calculations used here are based on the discrete differential form representation of the finite elements method, while the Monte Carlo method makes foundation of the particle part of the simulations. The first example is the simulation of the feature profile evolution during SiO2 etching in flourocarbon plasma based on the sparse field method for solving level set equations. Etching velocities on the profile surface are determined using Monte Carlo method for the particle flux calculations. The model takes into account pure chemical and ion-enhanced chemical etching mechanisms. Another example is connected with the design of a spiral inflector which is one of the key devices of the axial injection system of the VINCY Cyclotron.