Simultaneous potential and circuit solution for 1D bounded plasma particle simulation codes
Journal of Computational Physics
A Level-Set Approach to 3D Reconstruction from Range Data
International Journal of Computer Vision
Plasma Physics Via Computer
Teaching electromagnetic field theory using differential forms
IEEE Transactions on Education
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In this paper we present a methodology and some of the results for 3D simulations that includes both field and particle abstractions. Electromagnetic field calculations used here are based on the discrete differential form representation of the finite elements method, while the Monte Carlo method makes foundation of the particle part of the simulations. The first example is the simulation of the feature profile evolution during SiO2 etching in flourocarbon plasma based on the sparse field method for solving level set equations. Etching velocities on the profile surface are determined using Monte Carlo method for the particle flux calculations. The model takes into account pure chemical and ion-enhanced chemical etching mechanisms. Another example is connected with the design of a spiral inflector which is one of the key devices of the axial injection system of the VINCY Cyclotron.