Effect of deposition conditions on thermo-mechanical properties of free standing silicon-rich silicon nitride thin film

  • Authors:

  • Yun Hwangbo;Jung-Min Park;Walter L. Brown;Jun-Hwan Goo;Hak-Joo Lee;Seungmin Hyun

  • Affiliations:

  • Department of Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon 305-343, Republic of Korea;Samsung Electro-Mechanics Co., 314, Maetan3-Dong, Yeongtong-Gu, Suwon, Gyunggi-Do 443-743, Republic of Korea;Department of Materials Science and Engineering, Lehigh University, Bethlehem, PA 18015-3195, USA;Department of Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon 305-343, Republic of Korea;Department of Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon 305-343, Republic of Korea;Department of Nano Convergence and Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-gu, Daejeon 305-343, Republic of Korea

  • Venue:
  • Microelectronic Engineering
  • Year:
  • 2012

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Abstract

Using resonance and bulge techniques, the mechanical properties of free standing Si-rich SiN"x membranes were precisely measured to evaluate the effect of deposition conditions on them over a narrow range of particular technological interest. Values of the elastic modulus, the residual stress and the thermal expansion coefficient were obtained. It was found that even small differences in gas composition in low pressure CVD deposition make substantial changes in residual stress and significant but much smaller changes in the elastic modulus.