A fast spatial patch blending algorithm for artefact reduction in pattern-based image inpainting

  • Authors:
  • Maxime Daisy;David Tschumperlé;Olivier Lézoray

  • Affiliations:
  • GREYC Laboratory (CNRS UMR 6072), Caen/France;GREYC Laboratory (CNRS UMR 6072), Caen/France;GREYC Laboratory (CNRS UMR 6072), Caen/France

  • Venue:
  • SIGGRAPH Asia 2013 Technical Briefs
  • Year:
  • 2013

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Abstract

We propose a fast and generic spatial patch blending technique that can be embedded within any kind of pattern-based inpainting algorithm. This extends our previous work on the visual enhancement of inpainting results. We optimize this blending algorithm so that the processing time is roughly divided by a factor ten, without any loss of perceived quality. Moreover, we provide an open-source and simple-to-use software to make this easily reproducible.