Electromigration resistance of copper interconnects

• Authors:

• D. Save;F. Braud;J. Torres;F. Binder;C. Müller;J. O. Weidner;W. Hasse

• Affiliations:

• -;-;-;-;-;-;-

• Venue:
• AMI '96 Proceedings of the symposium J of the 1996 E-MRS Spring meeting conference on Advanced materials for interconnections
• Year:
• 1996