A data architecture for an uncertain design and manufacturing environment

Authors:
Thomas R. Smith
Affiliations:
Digital Equipment Corporation, 100 Minuteman Road, APO-1/C3, Andover, Massachusetts
Venue:
DAC '85 Proceedings of the 22nd ACM/IEEE Design Automation Conference
Year:
1985

Citing 4
Cited 1

GAMMA: a fast prototype design, build, and test process

DAC '85 Proceedings of the 22nd ACM/IEEE Design Automation Conference
Some Computer Aided Engineering System design principles

DAC '83 Proceedings of the 20th Design Automation Conference
The evolution of an integrated data base

DAC '75 Proceedings of the 12th Design Automation Conference
A database approach for managing VLSI design data

DAC '82 Proceedings of the 19th Design Automation Conference

PEARL: an expert system for power supply layout

DAC '86 Proceedings of the 23rd ACM/IEEE Design Automation Conference

Quantified Score

Hi-index	0.00

Visualization

Abstract

Traditional methods for resistance calculation suffer from some unfavourable features, that make them uncomfortable to use. Although requiring a lot of manual processing, they are rather inaccurate and often claim for severe artwork restrictions (e.g. orthogonal geometry)which conflict with the desire for most dense layouts.This paper describes a resistance calculation program called REX (Resistance Extractor), which is based on the well-known Finite Element Method (FEM). Highly felxible in use, it is able to process designed and parasitic resistors of any shape and material with adjustable precision. REX is part of the layout verification system ALAS, designed for mask artwork analysis of bipolar circuits.