C. E. Ramberg;E. Blanquet;M. Pons;C. Bernard;R. Madar
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Diffusion barrier performance of reactively sputtered Ta-W-N between Cu and Si
Microelectronic Engineering
Interfacial reactions and electrical properties of hafnium-based thin films in Cu/barrier/n+-p junction diodes
Reliability of multistacked tantalum-based structure as the barrier film in ultralarge-scale integrated metallization
Density functional study of the stability and electronic properties of TaxNy compounds used as copper diffusion barriers