Nanoreplication in polymers using hot embossing and injection molding

  • Authors:

  • H. Schift;C. David;M. Gabriel;J. Gobrecht;L. J. Heyderman;W. Kaiser;S. Köppel;L. Scandella

  • Affiliations:

  • Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland;Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland;AWM Werkzeugbau, CH-5630 Muri AG, Switzerland;Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland;Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland;Fachhochshule Aargau, CH-5200 Windisch, Switzerland;Netstal Maschinen AG, CH-8752 Näfels, Switzerland;Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland

  • Venue:
  • MNE '99 Proceedings of the 25th international conference on Microelectronic engineering
  • Year:
  • 2000

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Abstract

With polymer molding techniques, it is possible to fabricate nanostructures with a replication fidelity of 25 nanometers. Both hot embossing and injection molding can be used, and cycle times of down to 4 sec can be achieved in a CD injection molding process. The resolution is far below the structure size found today in compact disc memory media. The master structures are produced by electron beam lithography and subsequent dry etching.