Fabrication of a micromachined magnetic X/Y/Z scanner for parallel scanning probe applications

Authors:
H. Rothuizen;U. Drechsler;G. Genolet;W. Häberle;M. Lutwyche;R. Stutz;R. Widmer;P. Vettiger
Affiliations:
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland;IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland
Venue:
MNE '99 Proceedings of the 25th international conference on Microelectronic engineering
Year:
2000

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Abstract

Traditionally, lithography has been the driving force behind the exponential growth rate of Microelectronics, thanks also to the easy scalability of MOS devices. Even if up to now every prophecy for a slow-down of the growth rate has been proven false, ...