A Line Extraction Method for Automated SEM Inspection of VLSI Resist

  • Authors:
  • B. Shu;C. C. Li;J. F. Mancuso;Y. N. Sun

  • Affiliations:
  • -;-;-;-

  • Venue:
  • IEEE Transactions on Pattern Analysis and Machine Intelligence
  • Year:
  • 1988

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Abstract

A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform.