The Position-Orientation Masking Approach to Parametric Search for Template Matching

  • Authors:
  • D. W. Paglieroni;G. E. Ford;E. M. Tsujimoto

  • Affiliations:
  • -;-;-

  • Venue:
  • IEEE Transactions on Pattern Analysis and Machine Intelligence
  • Year:
  • 1994

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Abstract

A new search method over (x,y,/spl theta/), called position-orientation masking is introduced. It is applied to vertices that are allowed to be separated into different bands of acuteness. Position-orientation masking yields exactly one /spl theta/ value for each (x,y) that it considers to be the location of a possible occurrence of an object. Detailed matching of edge segments is performed at only these candidate (x,y,/spl theta/) to determine if objects actually do occur there. Template matching is accelerated dramatically since the candidates comprise only a small fraction of all (x,y,/spl theta/). Position-orientation masking eliminates the need for exhaustive search when deriving the candidate (x,y,/spl theta/). Search is guided by correlations between template vertices and distance transforms of image vertices. When a poor correlation is encountered at a particular position and orientation, nearby positions at that orientation and nearby orientations at that position are masked out. Position and orientation traversal are by quadrant and binary decomposition.