Parallel Numerical Solution of the Boltzmann Equation for Atomic Layer Deposition (Research Note)

Authors:
Samuel G. Webster;Matthias K. Gobbert;Jean-François Remacle;Timothy S. Cale
Affiliations:
-;-;-;-
Venue:
Euro-Par '02 Proceedings of the 8th International Euro-Par Conference on Parallel Processing
Year:
2002

Citing 2
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Abstract

Atomic Layer Deposition is one step in the industrial manufacturing of semiconductor chips. It is mathematically modeled by the Boltzmann equation of gas dynamics. Using an expansion in velocity space, the Boltzmann equation is converted to a system of linear hyperbolic equations. The discontinuous Galerkin method is used to solve this system. The speedup becomes near-perfect for the most complex two-dimensional cases. This demonstrates that the code allows for efficient parallel computation of long-time studies, in particular for the three-dimensional model.