SUZANA: A 3D CAD Tool for Anisotropically Etched Silicon Microstructures

Authors:
S. Büttgenbach;O. Than
Affiliations:
Institute for Microtechnology, Technical University of Braunschweig, D-38 106 Braunschweig, Germany;Institute for Microtechnology, Technical University of Braunschweig, D-38 106 Braunschweig, Germany
Venue:
EDTC '96 Proceedings of the 1996 European conference on Design and Test
Year:
1996

Citing 1
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Abstract

This paper reports on a workstation-based simulation module for silicon anisotropic etching using a cellular automata model. Starting from 2D mask data, the program delivers a 3D solid geometric model of the etched structure, which can be transferred to other modeling tools like FEM. The capabilities of the CAD tool are demonstrated by comparing simulation results to realized microstructures.