Analysis of Moire Patterns in Non-Uniformly Sampled Halftones

  • Authors:
  • Xiangdong Liu;Roger Ehrich

  • Affiliations:
  • -;-

  • Venue:
  • WACV '96 Proceedings of the 3rd IEEE Workshop on Applications of Computer Vision (WACV '96)
  • Year:
  • 1996

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Abstract

In this paper we analyze the moire patterns in halftone images scanned by a popular commercial scanner. We show that the non-uniform sampling scheme employed by the scanner introduces extra aliasing components compared to uniform sampling and thus complicates the moire patterns formed. The analysis applies to other scanners that employ non-uniform sampling. We also suggest methods for suppressing the moire patterns in scanned halftones.