Morphology, microstructure, and mechanical properties of a copper electrodeposit

  • Authors:
  • D. T. Read;Y. W. Cheng;R. Geiss

  • Affiliations:
  • National Institute of Standards and Technology, Mail Stop 853.08, 325 Broadway, Boulder, CO;National Institute of Standards and Technology, Mail Stop 853.08, 325 Broadway, Boulder, CO;National Institute of Standards and Technology, Mail Stop 853.08, 325 Broadway, Boulder, CO

  • Venue:
  • Microelectronic Engineering - Proceedings of the symposium on characterization and mechanical reliability of advanced electronic materials at nanoscale, 2003 ASME mechanics and materials conference
  • Year:
  • 2004

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Abstract

This paper presents two new experimental observations on electrodeposited copper: unusual morphology as seen in the scanning electron microscope at high magnification, and mechanical properties, as measured by tensile testing. We report detailed characterization of a 2.6 µm thick copper electrodeposit, made on silicon using laboratory procedures and similar to materials now widely used in advanced electronic interconnect structures. The microstructure was characterized by X-ray diffraction, electron backscattered diffraction, imaging in a field emission scanning electron microscope (FESEM), and microtensile testing. Initial observations indicated microstructural dimensions and mechanical properties in the expected ranges. However, using high-magnification, high resolution imaging in the FESEM, we found a surprising result: the morphology of this electrodeposit resembled an agglomeration of round balls or spheres approximately 30-50 nm in diameter. Both X-ray and electron diffraction results showed grain and subgrain sizes much larger than the individual spheres. Molecular dynamics (MD) simulations of spheres of copper atoms were carried out to interpret the observations, and produced a degree of interpenetration of the spheres that was consistent with the observations. However, in MD simulations of two initially misoriented spheres of up to a thousand atoms, with diameters up to 3 nm and for durations up to 30 ps, the spheres readily agglomerated but remained misoriented. So, the mechanism and rate of crystallographic grain growth within the agglomeration of spheroids remains unknown. This unusual spheroidal morphology may be related to the unusual room-temperature grain growth observed in electrodeposited copper.