Using Adapted Levenshtein Distance for On-Line Signature Authentication

  • Authors:
  • Sascha Schimke;Claus Vielhauer;Jana Dittmann

  • Affiliations:
  • Otto-von-Guericke University Magdeburg, Germany;Otto-von-Guericke University Magdeburg, Germany;Otto-von-Guericke University Magdeburg, Germany

  • Venue:
  • ICPR '04 Proceedings of the Pattern Recognition, 17th International Conference on (ICPR'04) Volume 2 - Volume 02
  • Year:
  • 2004

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Abstract

In this paper a new method for on-line signature authentication will be presented, which is based on a event-string modelling of features derived from pen-position and pressure signals of digitizer tablets. A distance measure well known from textual pattern recognition, the Levenshtein Distance, is used for comparison of signatures and classification is carried out applying a nearest neighbor classifier. Results from a test set of 1376 signatures from 41 persons are presented, which have been conducted for four different feature sets. The results are rather encouraging, with correct identification rates of 96% at zero false classifications.