Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

  • Authors:

  • P. Ferrand;J. Seekamp;M. Egen;R. Zentel;S. G. Romanov;C. M. Sotomayor Torres

  • Affiliations:

  • Institute of Materials Science and Department of Electrical and Information Engineering, University of Wuppertal, Gauss-Str. 20, D-42097 Wuppertal, Germany;Institute of Materials Science and Department of Electrical and Information Engineering, University of Wuppertal, Gauss-Str. 20, D-42097 Wuppertal, Germany;Institute for Organic Chemistry, Department of Chemistry and Pharmacy University of Mainz Duesbergweg 10-14, D-55099 Mainz, Germany;Institute for Organic Chemistry, Department of Chemistry and Pharmacy University of Mainz Duesbergweg 10-14, D-55099 Mainz, Germany;Institute of Materials Science and Department of Electrical and Information Engineering, University of Wuppertal, Gauss-Str. 20, D-42097 Wuppertal, Germany;Institute of Materials Science and Department of Electrical and Information Engineering, University of Wuppertal, Gauss-Str. 20, D-42097 Wuppertal, Germany

  • Venue:
  • Microelectronic Engineering - Proceedings of the 29th international conference on micro and nano engineering
  • Year:
  • 2004

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Abstract

The deterministic fabrication of microscopic structures in self-assembled three-dimensional (3D) photonic crystals is reported. Microscopic 1 µm deep controlled structures, cavities with width as small as 5 µm and trenches as narrow as 2 µm, were fabricated using direct electron-beam writing on a poly(methyl methacrylate) (PMMA) opal film. The technique is highly accurate, versatile and is probably suitable to fabricate buried defects.