Process equipment modeling: resident-entity based simulation of batch chamber tools in 300mm semiconductor manufacturing

  • Authors:
  • Nirmal Govind;David Fronckowiak

  • Affiliations:
  • The Pennsylvania State University, University Park, PA;IBM Microelectronics Hopewell Junction, NY

  • Venue:
  • Proceedings of the 35th conference on Winter simulation: driving innovation
  • Year:
  • 2003

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Abstract

This paper describes a resident-entity based pilot simulation study of a class of tools used in 300mm semiconductor manufacturing known as the wets tools or the wet benches. These are batch chamber tools - they have several chambers or tanks, each of which can accommodate a batch of wafers, usually more than one lot size. We develop a simulation model for the wets processing area that is based on the resident-entity paradigm, but makes use of transient-entity-type modeling when more information needs to be tracked. Resident-entity models tend to be much faster than transientity simulation models that are common in semiconductor manufacturing. The model developed captures most of the internal workings of a wets tool and at the same time, models different types of tools. We used the model to evaluate the effects of scheduling policies and batching parameters on the performance of the wets process area.