A new algorithm for layout of dark field alternating phase shifting masks

Authors:
Qinglang Luo;Xianlong Hong;Qiang Zhou;Yici Cai
Affiliations:
Tsinghua University, Beijing, China;Tsinghua University, Beijing, China;Tsinghua University, Beijing, China;Tsinghua University, Beijing, China
Venue:
GLSVLSI '05 Proceedings of the 15th ACM Great Lakes symposium on VLSI
Year:
2005

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Abstract

A new methodology is proposed to accelerate AltPSM design flow for dark field AltPSM for large-scale layouts. When scaling to large-scale layouts, designing AltPSM may be much time consuming. Our new algorithm solves this problem by splitting a layout into smaller, easier-to-solve parts, solving the sub-layouts independently and simultaneously, and then recombining the sub-layouts. The experimental results on industry layouts indicate that parallel algorithm has potential to provide more significant improvement in speed and achieve a better quality of solutions.