Optimization of Global Interconnects in High Performance VLSI Circuits

  • Authors:
  • Min Tang;Jun-Fa Mao

  • Affiliations:
  • Shanghai Jiao Tong University;Shanghai Jiao Tong University

  • Venue:
  • VLSID '06 Proceedings of the 19th International Conference on VLSI Design held jointly with 5th International Conference on Embedded Systems Design
  • Year:
  • 2006

Quantified Score

Hi-index 0.00

Visualization

Abstract

This paper presents a novel methodology of global interconnect optimization for high performance integrated circuits. The impacts of interconnect width and spacing on various performances such as delay, power dissipation and chip area are analyzed. A tradeoff exists between delay and power dissipation of global interconnects with repeaters insertion. Optimum line width is determined by the minimum delay-power product which is defined as a figure of merit (FOM). As the silicon area and wireability of chip are taken into account, the delay-power-area product is introduced as another FOM to optimize the global interconnects. Optimizations of global interconnect size with different scenarios are applied for various International Technology Roadmap for Semiconductor technology nodes.