Power supply noise analysis methodology for deep-submicron VLSI chip design
DAC '97 Proceedings of the 34th annual Design Automation Conference
(Ba,Sr)TiO3 dielectrics for future stacked- capacitor DRAM
IBM Journal of Research and Development
Nanocrystal nonvolatile memory devices
IEEE Transactions on Nanotechnology
Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly
IEEE Transactions on Nanotechnology
Proceedings of the International Conference on Computer-Aided Design
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We are inspired by the beauty and simplicity of self-organizing materials and the promise they hold for enabling continued improvements in semiconductor technology. Self assembly is the spontaneous arrangement of individual elements into regular patterns," under suitable conditions, certain materials self organize into useful nanometer-scale patterns of importance to high-performance microelectronics applications. Polymer self assembly is a nontraditional approach to patterning integrated circuit elements at dimensions and densities inaccessible to traditional lithography methods. We review here our efforts in IBM to develop and integrate self-assembly processes as high-resolution patterning alternatives and to demonstrate targeted applications in semiconductor device fabrication. We also provide a framework for understanding key requirements for the adoption of polymer self-assembly processes into semiconductor technology, as well as a discussion of the ultimate dimensional scalability of the technique.