The complexity of the outer face in arrangements of random segments

  • Authors:
  • Noga Alon;Dan Halperin;Oren Nechushtan;Micha Sharir

  • Affiliations:
  • Tel-Aviv University, Tel Aviv, Israel;Tel-Aviv University, Tel Aviv, Israel;Tel-Aviv University, Tel Aviv, Israel;Tel-Aviv University, Tel Aviv, Israel

  • Venue:
  • Proceedings of the twenty-fourth annual symposium on Computational geometry
  • Year:
  • 2008

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Abstract

We investigate the complexity of the outer face in arrangements of line segments of a fixed length in the plane, drawn uniformly at random within a square. We derive upper bounds on the expected complexity of the outer face, and establish a certain phase transition phenomenon during which the expected complexity of the outer face drops sharply as a function of the total number of segments. In particular we show that up till the phase transition the complexity of the outer face is almost linear in n, and that after the phase transition, the complexity of the outer face is roughly proportional to pn. Our study is motivated by the analysis of a practical point-location algorithm (so-called walk-along-a-line point-location algorithm) and indeed, it explains experimental observations of the behavior of the algorithm on arrangements of random segments.