Efficient Node Overlap Removal Using a Proximity Stress Model

Authors:
Emden R. Gansner;Yifan Hu
Affiliations:
AT&T Labs, Shannon Laboratory, Florham Park, NJ 07932;AT&T Labs, Shannon Laboratory, Florham Park, NJ 07932
Venue:
Graph Drawing
Year:
2009

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Abstract

When drawing graphs whose nodes contain text or graphics, the nontrivial node sizes must be taken into account, either as part of the initial layout or as a post-processing step. The core problem is to avoid overlaps while retaining the structural information inherent in a layout using little additional area. This paper presents a new node overlap removal algorithm that does well by these measures.