Use of lithography simulation for the calibration of equation-based design rule checks

  • Authors:

  • David Abercrombie;Fedor Pikus;Cosmin Cazan

  • Affiliations:

  • Mentor Graphics Corp., Wilsonville, OR;Mentor Graphics Corp., Wilsonville, OR;Mentor Graphics Corp., Wilsonville, OR

  • Venue:
  • Proceedings of the 46th Annual Design Automation Conference
  • Year:
  • 2009

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Abstract

Designers using one-dimension measurements in nanometer designs can't readily identify features prone to excessive variation during processing. Process simulation provides high resolution checking, but requires significant computing resources. Equation-based design rule checking (eqDRC) offers the DRC performance with capture of complex process issues using multi-dimensional equations. One challenge to adopting eqDRC is the definition and calibration of the equations. We will show how a lithographic simulator can be used to define and calibrate an eqDRC equation.