CAD for nanometer silicon design challenges and success
IEEE Transactions on Very Large Scale Integration (VLSI) Systems - Nanoelectronic circuits and systems
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Process modeling is an integral portion of technology computer-aided design (TCAD) and can be used to predict device structures and doping. Truly predictive process modeling has proven to be an elusive goal, because the controlling physics is complicated and difficult to investigate experimentally. The current state of process modeling is reviewed, and current and future challenges are discussed. Recent helpful trends are indicated, and problems that must be addressed are identified.