Exploration of VLSI CAD researches for early design rule evaluation

Authors:
Chul-Hong Park;David Z. Pan;Kevin Lucas
Affiliations:
CAE, Semiconductor R&D center, Samsung Electronics;University of Texas at Austin;Silicon Engineering Group, Synopsys Inc.
Venue:
Proceedings of the 16th Asia and South Pacific Design Automation Conference
Year:
2011

Citing 2
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A framework for early and systematic evaluation of design rules

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Layout decomposition approaches for double patterning lithography

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems - Special issue on the 2009 ACM/IEEE international symposium on networks-on-chip

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Abstract

Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer's role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches for early and systematic evaluation of design rule, which will be a key technique for enhancing the competitiveness in IC market.