The control of membrane thickness in PECVD process utilizing a rule extraction technique of neural networks

  • Authors:
  • Ming Chang;Jen-Cheng Chen;Jia-Sheng Heh

  • Affiliations:
  • Department of Mechanical Engineering, Chung Yuan Christian University;Department of Electronic Engineering, Chung Yuan Christian University;Department of Information and Computer Engineering, Chung Yuan Christian University

  • Venue:
  • ISNN'06 Proceedings of the Third international conference on Advances in Neural Networks - Volume Part III
  • Year:
  • 2006

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Abstract

The principal object of this paper is to develop a neural network model, which can simulate the plasma enhanced chemical vapor deposition (PECVD) process in TFT-Array procedure. Then the Boolean logic rules are extracted from the trained neural network in order to establish a knowledge base of expert system. The input data of neural network was collected form the process parameters of PECVD machines in the TFT-Array department, included the flow rate of all gases, pressure and temperature of the chamber, etc. After checking, explaining and integrating the extraction rules into knowledge base, the rules can be the basics of membrane thickness prediction and alarm diagnosis in PECVD system.