Proceedings of the conference on Design, automation and test in Europe: Proceedings
Hierarchical Probabilistic Macromodeling for QCA Circuits
IEEE Transactions on Computers
Using CAD to shape experiments in molecular QCA
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
On the Tolerance to Manufacturing Defects in Molecular QCA Tiles for Processing-by-wire
Journal of Electronic Testing: Theory and Applications
An Overview of Nanoscale Devices and Circuits
IEEE Design & Test
A model for computing and energy dissipation of molecular QCA devices and circuits
ACM Journal on Emerging Technologies in Computing Systems (JETC)
Molecular QCA design with chemically reasonable constraints
ACM Journal on Emerging Technologies in Computing Systems (JETC)
Monomer Control for Error Tolerance in DNA Self-Assembly
Journal of Electronic Testing: Theory and Applications
Thermal switching error versus delay tradeoffs in clocked QCA circuits
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
A shift-register-based QCA memory architecture
ACM Journal on Emerging Technologies in Computing Systems (JETC)
On the computational complexity of tile set synthesis for DNA self-assembly
IEEE Transactions on Circuits and Systems II: Express Briefs
Binary Adders on Quantum-Dot Cellular Automata
Journal of Signal Processing Systems
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Electron beam lithography (EBL) patterning of poly(methylmethacrylate) (PMMA) is a versatile tool for defining molecular structures on the sub-10-nm scale. We demonstrate lithographic resolution to about 5 nm using a cold-development technique. Liftoff of sub-10-nm Au nanoparticles and metal lines proves that cold development completely clears the PMMA residue on the exposed areas. Molecular liftoff is performed to pattern DNA rafts with high fidelity at linewidths of about 100 nm. High-resolution EBL and molecular liftoff can be applied to pattern Creutz-Taube molecules on the scale of a few nanometers for quantum-dot cellular automata.