Improved Linear Light Source material reflectance scanning

Authors:
Jan Meseth;Shawn Hempel;Andrea Weidlich;Lynn Fyffe;Graham Fyffe;Craig Miller;Paul Carroll;Paul Debevec
Affiliations:
RTT AG;RTT AG;RTT AG;RTT AG;RTT AG;RTT AG;RTT AG;RTT AG and USC ICT
Venue:
ACM SIGGRAPH 2012 Talks
Year:
2012

Citing 2
Cited 1

Linear light source reflectometry

ACM SIGGRAPH 2003 Papers
Pocket reflectometry

ACM SIGGRAPH 2011 papers

Polarised light in computer graphics

SIGGRAPH Asia 2012 Courses

Quantified Score

Hi-index	0.00

Visualization

Abstract

We improve the resolution, accuracy, and efficiency of Linear Light Source (LLS) Reflectometry with several acquisition setup and data processing improvements, allowing spatially-varying reflectance parameters of complex materials to be recorded with unprecedented accuracy and efficiency.