Nonlinear optimization to generate non-overlapping random dot patterns

Authors:
Takashi Imamichi;Hidetoshi Numata;Hideyuki Mizuta;Tsuyoshi Idé
Affiliations:
IBM Research -- Tokyo, Yamato, Kanagawa, Japan;IBM Research -- Tokyo, Yamato, Kanagawa, Japan;IBM Research -- Tokyo, Yamato, Kanagawa, Japan;IBM Research -- Tokyo, Yamato, Kanagawa, Japan
Venue:
Proceedings of the Winter Simulation Conference
Year:
2011

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Abstract

We have devised a method to generate non-overlapping random dot patterns for light guides and diffuser films in liquid crystal displays (LCDs). Molecular-dynamics-based algorithms are being for this purpose and have been proven to generate high quality dot patterns. The key technical challenge is how to remove inter-dot overlap that leads to visible roughness in the luminance distribution. In this paper, we describe a new overlap removal method that penalizes the overlap of dots and minimizes the sum of the penalties by using a nonlinear optimization technique. Through computational experiments with real world data, we show that our optimization-based method runs faster than an existing simulation-based method and generates dot patterns with comparable quality.