Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
On projection methods, convergence and robust formulations in topology optimization
Structural and Multidisciplinary Optimization
A new level-set based approach to shape and topology optimization under geometric uncertainty
Structural and Multidisciplinary Optimization
A novel hierarchical approach for proximity effect correction in electron beam lithography
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Mask Design for Optical Microlithography—An Inverse Imaging Problem
IEEE Transactions on Image Processing
Structural and Multidisciplinary Optimization
Robust topology optimization accounting for misplacement of material
Structural and Multidisciplinary Optimization
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The aim of this paper is to incorporate a model for micro/nano lithography production processes in topology optimization. The production process turns out to provide a physical analogy for projection filters in topology optimization. Blueprints supplied by the designers cannot be directly used as inputs to lithographic processes due to the proximity effect which causes rounding of sharp corners and geometric interaction of closely spaced design elements. Therefore, topology optimization is applied as a tool for proximity effect correction. Furthermore, it is demonstrated that the robust projection filter can be used to account for uncertainties due to lithographic production processes which results in manufacturable blueprint designs and eliminates the need for subsequent corrections.