TIP-OPC: a new topological invariant paradigm for pixel based optical proximity correction
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
A highly efficient optimization algorithm for pixel manipulation in inverse lithography technique
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Performance-based optical proximity correction methodology
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
A robust pixel-based RET optimization algorithm independent of initial conditions
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
Line search-based inverse lithography technique for mask design
VLSI Design - Special issue on New Algorithmic Techniques for Complex EDA Problems
On the similarities between micro/nano lithography and topology optimization projection methods
Structural and Multidisciplinary Optimization
| Hi-index | 0.01 |
In all imaging systems, the forward process introduces undesirable effects that cause the output signal to be a distorted version of the input. A typical example is of course the blur introduced by the aperture. When the input to such systems can be controlled, prewarping techniques can be employed which consist of systematically modifying the input such that it (at least approximately) cancels out (or compensates for) the process losses. In this paper, we focus on the optical proximity correction mask design problem for "optical microlithography," a process similar to photographic printing used for transferring binary circuit patterns onto silicon wafers. We consider the idealized case of an incoherent imaging system and solve an inverse problem which is an approximation of the real-world optical lithography problem. Our algorithm is based on pixel-based mask representation and uses a continuous function formulation. We also employ the regularization framework to control the tone and complexity of the synthesized masks. Finally, we discuss the extension of our framework to coherent and (the more practical) partially coherent imaging systems