Numerical recipes in C (2nd ed.): the art of scientific computing
Numerical recipes in C (2nd ed.): the art of scientific computing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Process variation aware OPC with variational lithography modeling
Proceedings of the 43rd annual Design Automation Conference
Mask Design for Optical Microlithography—An Inverse Imaging Problem
IEEE Transactions on Image Processing
FPGA-Based Hardware Acceleration of Lithographic Aerial Image Simulation
ACM Transactions on Reconfigurable Technology and Systems (TRETS)
Optical lithography simulation using wavelet transfor
ICCD'09 Proceedings of the 2009 IEEE international conference on Computer design
Information theoretic modeling and analysis for global interconnects with process variations
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
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It is important to reduce the Optical Proximity Correction (OPC) runtime while maintaining a good result quality. In this paper, we obtain a better formula, which theoretically speeds up the widely used method, Optimal Coherent Approximations (OCA's), by a factor of 2x. We speed up the OPC algorithm further by making it intensity based (IB-OPC), because it requires much less intensity simulations than the conventional Edge Placement Error (EPE) based OPC algorithms. In addition, the IB-OPC algorithm, which uses the efficiently computed sensitivity information, converges faster than the EPE based OPC. Our IB-OPC experimental results show a runtime speedup of up to 15x with a comparable result quality as of the EPE based OPC.