Subwavelength optical lithography: challenges and impact on physical design
ISPD '99 Proceedings of the 1999 international symposium on Physical design
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
RADAR: RET-aware detailed routing using fast lithography simulations
Proceedings of the 42nd annual Design Automation Conference
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
Lithographic aerial image simulation with FPGA-based hardwareacceleration
Proceedings of the 16th international ACM/SIGDA symposium on Field programmable gate arrays
A mask double patterning technique using litho simulation by wavelet transform
Proceedings of the 20th symposium on Great lakes symposium on VLSI
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Optical Lithography is an indispensible step in the process flow of Design for Manufacturability (DFM). Optical lithography simulation is a compute intensive task and simulation performance, or lack thereof can be a determining factor in time to market. Thus, the efficiency of lithography simulation is of paramount importance. Coherent decomposition is a popular simulation technique for aerial imaging simulation. In this paper, we propose an approximate simulation technique based on the 2D wavelet transform and use a number of optimization methods to further improve polygon edge detection. Results show that the proposed method suffers from an average error of less than 5% when compared with the coherent decomposition method. The benefits of the proposed method are (i) 10X increase in performance and more importantly (ii) it allows very large circuits to be simulated while some commercial tools are severely capacity limited. Approximate simulation is quite attractive for layout optimization where it may be used in a loop and may even be acceptable for final layout verification.