Diazopolysiloxanes: unique imageable barrier layers
Microelectronic Engineering
Challenges for 0.35-0.25 µm optical lithography
MNE '94 Proceedings of the international conference on Micro- and nano- engineering '94
Overview of gate linewidth control in the manufacture of CMOS logic chips
IBM Journal of Research and Development - Special issue: IBM CMOS technology
Manufacturing with DUV lithography
IBM Journal of Research and Development - Special issue: optical lithography I
Chemical amplification resists: history and development within IBM
IBM Journal of Research and Development - Special issue: optical lithography I
Chemical amplification resists: history and development within IBM
IBM Journal of Research and Development - Special issue: optical lithography I
Use of SU-8 photoresist for very high aspect ratio x-ray lithography
MNE '99 Proceedings of the 25th international conference on Microelectronic engineering
Electron beam lithography at 10keV using an epoxy based high resolution negative resist
Microelectronic Engineering
Chemical amplification resists: history and development within IBM
IBM Journal of Research and Development
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