Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS

• Authors:

• Russell A. Budd;Derek B. Dove;John L. Staples;Ronald M. Martino;Richard A. Ferguson;J. Tracy Weed

• Affiliations:

• -;-;-;-;-;-

• Venue:
• IBM Journal of Research and Development - Special issue: optical lithography I
• Year:
• 1997