Distributed Simulation of Silicon-Based Film Growth

Authors:
V. V. Krzhizhanovskaya;M. A. Zatevakhin;A. A. Ignatiev;Yuri E. Gorbachev;Peter M. A. Sloot
Affiliations:
-;-;-;-;-
Venue:
PPAM '01 Proceedings of the th International Conference on Parallel Processing and Applied Mathematics-Revised Papers
Year:
2001

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Abstract

We present a numerical scheme, grid generation and associated parallel algorithm for the simulation of silicon-based film growth in plasma enhanced chemical vapor deposition reactors. An MPI-based computing environment and advanced interactive software with graphic user interface, real-time visualization system and Web-based access were developed to provide distributed parallel multitask calculation and visualization on computer clusters. Analysis of system performance and cluster load-balancing indicates bottlenecks of the parallel implementation and ways to improve the algorithms.