Grid-Based Simulation of Industrial Thin-Film Production

Authors:
V. V. Krzhizhanovskaya;P. M.A. Sloot;Yu. E. Gorbachev
Affiliations:
Section Computational Science, University of Amsterdam, Kruislaan 403, NL-1098 SJ Amsterdam, the Netherlands and Institute of High Performance Computing and Data Bases, St. Petersburg State Polyte ...;Section Computational Science, University of Amsterdam, Kruislaan 403, NL-1098 SJ Amsterdam, the Netherlands;Institute for High Performance Computing and Data Bases, St. Petersburg State Polytechnic University, Polytechnicheskaya 29, St. Petersburg 195251, Russia
Venue:
Simulation
Year:
2005

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Abstract

In this article, the authors introduce a Grid-based virtual reactor, a High Level Architecture (HLA)- supported problem-solving environment that allows for detailed numerical study of industrial thin-film production in plasma-enhanced chemical vapor deposition (PECVD) reactors. They briefly describe the physics and chemistry underpinning the deposition process, the numerical approach to simulate these processes on advanced computer architectures, and the associated software environment supporting computational experiments. The authors built an efficient problem-solving environment for scientists studying PECVD processes and end users working in the chemical industry and validated the resulting virtual reactor against real experiments.