A New Visibility Partition for Affine Pattern Matching

  • Authors:
  • Michiel Hagedoorn;Mark H. Overmars;Remco C. Veltkamp

  • Affiliations:
  • -;-;-

  • Venue:
  • DGCI '00 Proceedings of the 9th International Conference on Discrete Geometry for Computer Imagery
  • Year:
  • 2000

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Abstract

Visibility partitions play an important role in computer vision and pattern matching. This paper studies a new type of visibility, reflection-visibility, with applications in affine pattern matching: it is used in the definition of the reflection metric between two patterns consisting of line segments. This metric is affine invariant, and robust against noise, deformation, blurring, and cracks. We present algorithms that compute the reflection visibility partition in O((n+k) log(n)+v) randomised time, where k is the number of visibility edges (at most O(n2)), and v is the number of vertices in the partition (at most O(n2+k2)). We use this partition to compute the reflection metric in O(r(nA + nB)) randomised time, for two line segment unions, with nA and nB line segments, separately, where r is the complexity of the overlay of two reflection-visibility partitions (at most O(nA4 + nB4)).