Line edge roughness: experimental results related to a two-parameter model

Authors:
L. H. A. Leunissen;W. G. Lawrence;M. Ercken
Affiliations:
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;Shipley Company LLC, 455 Forest St. Marlborough, MA;IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
Venue:
Microelectronic Engineering - Proceedings of the 29th international conference on micro and nano engineering
Year:
2004

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Abstract

Different techniques are available to describe line edge roughness (LER). Besides the standard deviation (σ), the spatial frequency components can be resolved using the power spectral density. Experiments show that LER can be described using a two-parameter model based on a first-order autoregressive process. In the model a correlation length and σ are determined to explain LER effects in the range up to several µm. Experiments are presented in which the model is verified and a physical background for the two constraints is given. A chemical model of the formation of the LER is presented. The impact of this model on the LER and critical dimension variation description as defined by the ITRS roadmap is determined.