Shape Localization Based on Statistical Method Using Extended Local Binary Pattern

  • Authors:
  • Xiangsheng Huang;Stan Z. Li;Yangsheng Wang

  • Affiliations:
  • Academy of Chinese Sciences;Academy of Chinese Sciences;Academy of Chinese Sciences

  • Venue:
  • ICIG '04 Proceedings of the Third International Conference on Image and Graphics
  • Year:
  • 2004

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Abstract

Accurate localization of representative points of a face is crucial to many face analysis and synthesis problems. Active Shape Model (ASM) is a powerful statistical tool for face alignment. However, it suffers from variations of pose, illumination and expressions. In this paper, we analyze the mechanism of Active Shape Model and realize that the ability of profiles normal to describe local appearance pattern is very limited. For efficient appearance pattern representation, local binary pattern is used and extended to describe local patterns of facial key points. For the purpose of retaining spatial information, sub-images of key points are divided into several regions, which are combined to define the extended local binary pattern (ELBP) histogram. Then we propose an improved ASM method framework, ELBP-ASM, in which local appearance patterns of key points are modelled using extended local binary pattern. Experimental results demonstrate that ELBP-ASM achieves more accurate results compared with original method used in ASM.