Dose control circuit for digital electrostatic electron-beam array lithography

  • Authors:

  • Chandra Sekhar Durisety;Rajagopal Vijayraghavan;Lakshmipriya Seshan;Syed K. Islam;Benjamin J. Blalock

  • Affiliations:

  • Dept. of Electrical and Computer Engineering, University of Tennessee, Knoxville 37996;Dept. of Electrical and Computer Engineering, University of Tennessee, Knoxville 37996;Intel Inc., Portland 97124;Dept. of Electrical and Computer Engineering, University of Tennessee, Knoxville 37996;Dept. of Electrical and Computer Engineering, University of Tennessee, Knoxville 37996

  • Venue:
  • Analog Integrated Circuits and Signal Processing
  • Year:
  • 2006

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Abstract

This paper demonstrates a technique for controlling the electron emission of an array of field emitting vertically aligned carbon nanofibers (VACNFs). An array of carbon nanofibers (CNF) is to be used as the source of electron beams for lithography purposes. This tool is intended to replace the mask in the conventional photolithography process by controlling their charge emission using the "Dose Control Circuitry" (DCC). The large variation in the charge emitted between CNFs grown in identical conditions forced the controller design to be based on fixed dose rather than on fixed time. Compact digital control logic has been designed for controlling the operation of DCC. This system has been implemented in a 0.5 驴m CMOS process.