A dispatching rule for photolithography scheduling with an on-line rework strategy

Authors:
D. Y. Sha;S. Y. Hsu;Z. H. Che;C. H. Chen
Affiliations:
Department of Industrial Engineering and Management, National Chiao Tung University, Hsinchu, Taiwan, ROC and Institute of Business Administration, Asia University, Wufeng, Taichung, Taiwan, ROC;Department of Industrial Engineering and Management, Chien Kuo University of Technology, Changhua, Taiwan, ROC;Department of Industrial Engineering and Management, National Taipei University of Technology, Taipei, Taiwan, ROC;SiSoft Research Center, National Chiao Tung University, Hsinchu, Taiwan, ROC
Venue:
Computers and Industrial Engineering
Year:
2006

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Abstract

Generally speaking, wafer fabrication factories define the photolithography area as the dispatching center of the entire factory. To establish a set of operative dispatching rules in the photolithography area while taking into consideration the rework of defective products would assist in coordinating and balancing the workload of the entire production line. Furthermore, it would help to enhance both the productivity and efficiency of the wafer fabrication, reduce the on-line WIP stock, shorten the production cycle time, and satisfy the requirements of customers regarding production due time and product quality. This research uses on-line rework as the basis for bringing the factor of reworking of a batch process into the dispatching rule for measurement. It then develops the dispatching rule (Rw-DR) which includes the rework strategy. In addition, this research focuses on the batch with high finished proportion in the photolithography area for finding a way to complete the manufacturing procedure faster, lighten the machine workload of the waiting line, and at the same time increase the output quantity.