Circuit and microarchitectural techniques for reducing cache leakage power
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Design and analysis of a 32nm PVT tolerant CMOS SRAM cell for low leakage and high stability
Integration, the VLSI Journal
Proceedings of the 20th symposium on Great lakes symposium on VLSI
Statistical DOE-ILP based power-performance-process (P3) optimization of nano-CMOS SRAM
Integration, the VLSI Journal
Hi-index | 0.00 |
This paper presents the design and evaluation of a new SRAM cell made of nine transistors (9T). The proposed 9T cell utilizes a scheme with separate read and write wordlines; it is shown that the 9T cell achieves improvements in power dissipation, performance and stability compared with previous designs (that require 10T and 8T) for low-power operation. The 9T scheme is amenable to small feature sizes as encountered in the deep sub-micron/nano ranges of CMOS technology.