Modeling plasma etching process using a radial basis function network
Microelectronic Engineering
Pattern Recognition Letters - Special issue: Artificial neural networks in pattern recognition
A neural-network approach for an automatic LED inspection system
Expert Systems with Applications: An International Journal
Clustered defect detection of high quality chips using self-supervised multilayer perceptron
Expert Systems with Applications: An International Journal
The application of neural networks to the papermaking industry
IEEE Transactions on Neural Networks
An adaptable time-delay neural-network algorithm for image sequence analysis
IEEE Transactions on Neural Networks
Hi-index | 12.05 |
In this paper, the predictions of optoelectronic attributes of Light-Emitting Diode (LED) chip, including luminous intensity, wavelength and forward voltage by using neural network were presented. The simulated data was measured by Electrical Luminescence (EL) technique. The well-trained neural models were used to predict the optoelectronic attributes of LED chip in its epitaxy growth stage in advance. These predicted results could provide the necessary information for the process engineer to adjust the control parameters of epitaxy growth accurately and then ensure the LED chip to be in conformance with the requested quality.