MOSFET modeling for 45nm and beyond
Proceedings of the 2007 IEEE/ACM international conference on Computer-aided design
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Statistical variability (SV) presents increasing challenges to CMOS scaling and integration at nanometer scales. It is essential that SV information is accurately captured by compact models in order to facilitate reliable variability aware design. Using statistical compact model parameter extraction for the new industry standard compact model PSP, we investigate the accuracy of standard statistical parameter generation strategies in statistical circuit simulations. Results indicate that the typical use of uncorrelated normal distribution of the statistical compact model parameters may introduce considerable errors in the statistical circuit simulations.